Title: Materials compatibility and organic build-up during ozone-based cleaning of semiconductor devices
Authors: De Smedt, Frank ×
De Gendt, Stefan
Heyns, MM
Vinckier, Christiaan #
Issue Date: Jan-2001
Publisher: Scitec publications ltd
Series Title: Ultra clean processing of silicon surfaces 2000 vol:76-77 pages:63-66
Abstract: The pH of deionized water (DI-water) was found to decrease when ozone was bubbled through the solution. This phenomenon was investigated by monitoring the change in chemical composition of the ozonated solution by means of Ion Chromatography (IC). It was found that nitrate, sulfate, formiate, acetate and oxalate ions were generated in the DI-water whereby these organic acids are responsible for the pH-decrease. These species are reaction products of the gas phase reaction between ozone and the Teflon tubing connecting the ozone generator to the reaction vessel.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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