Title: Surface characterization after different wet chemical cleans
Authors: Claes, M ×
Rohr, E
Conard, T
De Smedt, Frank
De Gendt, Stefan
Storm, W
Bauer, T
Mertens, P
Heyns, MM #
Issue Date: Jan-2001
Publisher: Scitec publications ltd
Series Title: Ultra clean processing of silicon surfaces 2000 vol:76-77 pages:67-70
Abstract: This paper describes the differences in passivation of silicon surfaces after a dHF or dHF/dHCl last step, either followed by a rinsing step or not, and oxidized by either ozonated cleans or by a SCI clean. The oxide thickness produced by ozonated cleans on dHF last surfaces is around 12 Angstrom, which is twice as high compared to the oxide thickness produced by a SCI clean. The presence of CL on dHF/dHCl last surfaces somewhat seems to enhance the oxide thickness, although also Cl levels are measured on dHF last surfaces. The F and Cl concentration seems to decrease after a supplementary treatment.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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