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Title: Determination of photoresist degradation products in O-3/DI processing
Authors: Vankerckhoven, Hans ×
De Smedt, Frank
Van Herp, B
Claes, M
De Gendt, Stefan
Heyns, MM
Vinckier, Christiaan #
Issue Date: Jan-2001
Publisher: Scitec publications ltd
Series Title: Ultra clean processing of silicon surfaces 2000 vol:76-77 pages:207-210
Abstract: The most important degradation products after ozone processing of two different types of photoresist (PR) (I-Line and DUV) were determined. Six low molecular weight carboxylic acids could be identified for the I-line PR, five for the DUV PR. The behaviour of these degradation products under continuous ozonation as well as their stability in water were also investigated. Despite the chemical similarity of these carboxylic acids, their behaviour appears to be very different.
ISSN: 1012-0394
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
Quantum Chemistry and Physical Chemistry Section
× corresponding author
# (joint) last author

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