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Title: Advanced oxidation processes in the removal of organics from silicon surfaces in IC manufacturing: Theoretical concepts
Authors: De Smedt, Frank ×
Vankerckhoven, Hans
Vinckier, Christiaan #
Issue Date: Jan-2003
Publisher: Taylor & francis inc
Series Title: Ozone-science & engineering vol:25 issue:5 pages:445-451
Abstract: Ozone is considered an environmentally friendly alternative for currently applied H2SO4-based mixtures in the cleaning of semiconductor devices. In order to implement ozone/water cleaning processes in practical systems, fundamental research is needed to understand the underlying chemical processes. Related to the removal of organic contamination from silicon surfaces, one needs to know whether ozone or radical species are the most efficient. A kinetic modeling study is performed to solve this problem whereby the pH is varied and different additives are checked. Theoretical concepts as Dominant Oxidation Pathway (DOP) and Radical Pool (RP) will be introduced for the evaluation of the various reaction pathways.
ISSN: 0191-9512
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
Quantum Chemistry and Physical Chemistry Section
× corresponding author
# (joint) last author

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