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Title: Surface quality of epitaxial CeO2 thin films grown on sapphire by aerosol MOCVD
Authors: Frohlich, K ×
Souc, J
Machajdik, D
Jergel, M
Snauwaert, Johan
Hellemans, Louis #
Issue Date: Jan-1998
Publisher: Wiley-v c h verlag gmbh
Series Title: Chemical vapor deposition vol:4 issue:6 pages:216-+
Abstract: Cerium oxide has potential as an excellent material for buffer layers in high-temperature superconductor thin films. Here a low pressure aerosol MOCVD process is used for preparing high quality (001) epitaxial ceria films on oriented sapphire substrates. By controlling the maximum temperature for the volatilization of the precursor, a smooth surface with a roughness R-q = 0.56 nm is obtained (see Figure).
ISSN: 0948-1907
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Chemistry - miscellaneous
× corresponding author
# (joint) last author

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