Title: Effects of halo doping and Si capping layer thickness on total-dose effects in Ge p-MOSFETs
Authors: Arora, Rajan ×
Simoen, Eddy
Zhang, En Xia
Fleetwood, Daniel M
Schrimpf, Ronald D
Galloway, Kenneth F
Choi, Bo K
Mitard, Jerome
Meuris, Marc
Claeys, Cor
Madan, Anuj
Cressler, John D #
Issue Date: Aug-2010
Publisher: IEEE
Series Title: IEEE Transactions on Nuclear Science vol:57 issue:4 pages:1933-1939
ISSN: 0018-9499
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science