|ITEM METADATA RECORD
|Title: ||Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node|
|Authors: ||Wong, Patrick|
Vaglio Pret, Alessandro
Vandenbroeck, Nadia #
|Issue Date: ||2010 |
|Publisher: ||Technical Association of Photo|
|Series Title: ||Journal of Photopolymer Science and Technology vol:23 issue:2 pages:185-192|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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