Title: New SPM concept for accurate and repeatable tip positioning
Authors: Duriau, Edouard
Clarysse, Marc
Moussa, Alain
Vanhaeren, Danielle
Eyben, Pierre
Hantschel, Thomas
Vandervorst, Wilfried #
Issue Date: Apr-2009
Publisher: Elsevier
Series Title: Microelectronic Engineering vol:86 issue:4-6 pages:1234-1237
Conference: International Conference on Micro- and Nano-Engineering edition:34 location:Athens, Greece date:15-18 September 2008
Abstract: In routine scanning probe microscopy (SPM) measurements either the tip is hidden underneath the cantilever and thus the position of the tip is only known with a very low accuracy (>5 mu m) or a high aspect-ratio tip is used which is visible but is very fragile. Furthermore, for electrical applications, visible tips are simply coated with a thin layer of active material that wears fast in case of high pressure applications such as scanning spreading resistance microscopy (SSRM).
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
# (joint) last author

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