Title: Silicide yield improvement with NiPtSi formation by laser anneal for advanced low power platform CMOS technology
Authors: Ortolland, Claude
Rosseel, Erik
Horiguchi, Naoto
Kerner, Christoph
Mertens, Sofie
Kittl, Jorge
Verleysen, Eveline
Bender, Hugo
Vandervorst, Wilfried
Lauwers, Anne
Absil, Philippe
Biesemans, Serge
Mathukrishnan, S
Srinivasan, S
Mayur, A.J
Schreutelkamp, Rob
Hoffmann, Thomas Y #
Issue Date: 2009
Host Document: Proceedings of the IEEE International Electron Devices Meeting - IEDM pages:23-26
Conference: IEEE International Electron Devices Meeting - IEDM location:Baltimore, MD USA date:7-dec-2009
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Nuclear and Radiation Physics Section
# (joint) last author

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