|ITEM METADATA RECORD
|Title: ||H2O and O3 based atomic layer deposition of high-k dielectric layers on high mobility substrates|
|Authors: ||Delabie, Annelies|
Alian, Ali Reza
Van Elshocht, Sven
Caymax, Matty #
|Issue Date: ||2009 |
|Host Document: ||Proceedings of the 9th International Conference on Atomic Layer Deposition - ALD|
|Conference: ||9th International Conference on Atomic Layer Deposition - ALD location:Monterey, CA USA date:19-jul-2009|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
Electrical Engineering - miscellaneous
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