Title: H2O and O3 based atomic layer deposition of high-k dielectric layers on high mobility substrates
Authors: Delabie, Annelies
Nyns, Laura
Alian, Ali Reza
Bellenger, Florence
Conard, Thierry
Franquet, Alexis
Sioncke, Sonja
Van Elshocht, Sven
Heyns, Marc
Meuris, Marc
Caymax, Matty #
Issue Date: 2009
Host Document: Proceedings of the 9th International Conference on Atomic Layer Deposition - ALD
Conference: 9th International Conference on Atomic Layer Deposition - ALD location:Monterey, CA USA date:19-jul-2009
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous
# (joint) last author

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