Title: Line width roughness mitigation in chemically amplified resist by post-litho processes
Authors: Vaglio Pret, Alessandro
Gronheid, Roel #
Issue Date: 2010
Publisher: Elsevier
Series Title: Microelectronic Engineering vol:87 issue:5-8 pages:1127-1130
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

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