|ITEM METADATA RECORD
|Title: ||Line width roughness mitigation in chemically amplified resist by post-litho processes|
|Authors: ||Vaglio Pret, Alessandro|
Gronheid, Roel #
|Issue Date: ||2010 |
|Series Title: ||Microelectronic Engineering vol:87 issue:5-8 pages:1127-1130|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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