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Title: Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Authors: Wilson, Chris ×
Croes, Kristof
Zhao, Chao
Metzger, T.H
Zhao, Larry
Beyer, Gerald
Horsfall, A.B
O'Neill, A.G
Tokei, Zsolt #
Issue Date: Sep-2009
Publisher: American Institute of Physics
Series Title: Journal of Applied Physics vol:106 issue:5
Article number: 53524
ISSN: 0021-8979
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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