This item still needs to be validated !
Title: Kinetic-study in a microwave-induced plasma afterglow of the cu(4(2)s) atom reaction with n2o from 458-k to 980-k and with no2 from 303-k to 762-k
Authors: Vinckier, Christiaan ×
Verhaeghe, T
Vanhees, Ingeborg #
Issue Date: Jan-1994
Publisher: Royal soc chemistry
Series Title: Journal of the chemical society-faraday transactions vol:90 issue:14 pages:2003-2007
Abstract: The rate constants for the reaction of ground-state copper atoms (4 2S) with N2O and NO2 have been derived in a fast-flow reactor. The microwave-induced plasma (MIP) afterglow technique was used for the generation of copper atoms in the gas phase. The rate constant for the reaction Cu(4 2S) + N2O --> CuO + N2 at temperatures between 458 and 980 K is found to be (2.4 +/- 0.6) x 10(-10) exp - (48.6 +/- 1.4 kJ mol-1/RT) cm3 molecule-1 s-1. The reaction Cu(4 2S) + NO2 --> products, was followed in the temperature range from 303 to 762 K and has a rate constant (1.3 +/- 0.6) x 10(-11) exp - (0.2 +/- 1.3 kJ mol-1/RT) cm3 molecule-1 s-1. From the copper atom decays in argon at 528 K, a diffusion coefficient, D(Cu, Ar) = 543.2 +/- 60.2 cm2 Torr s-1, could be derived.
ISSN: 0956-5000
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science