Title: Low temperature Si homo-epitaxy by reduced pressure chemical vapor deposition using dichlorosilane, silane and trisilane
Authors: Vincent, B. ×
Loo, R.
Vandervorst, Wilfried
Brammertz, G.
Caymax, M. #
Issue Date: 2010
Publisher: North-Holland Pub. Co.
Series Title: Journal of Crystal Growth pages:2671-2676
ISSN: 0022-0248
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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