Title: On the thermal expansion coefficient of CoSi2 and NiSi2
Authors: Smeets, Dries ×
Vanhoyland, G
D'Haen, J
Vantomme, André #
Issue Date: Dec-2009
Publisher: Institute of Physics and IOP Publishing
Series Title: Journal of Physics D, Applied Physics vol:42 issue:23 pages:-
Abstract: We have accurately determined the thermal expansion coefficients of CoSi2 and NiSi2 using high-temperature x-ray diffraction in the temperature range 300-850 K, resolving the ambiguity in the values reported in the literature. The room temperature (298 K) linear thermal expansion coefficients (alpha = (1/a(0))(partial derivative a/partial derivative T)) for CoSi2 and NiSi2 are found to be alpha CoSi2 = 14.4 +/- 0.6 x 10(-6)K(-1) and alpha(NiSi2) = 14.4 +/- 0.7 x 10(-6) K-1, respectively. Our results, however, strongly suggest that the thermal expansion coefficient of NiSi2 is temperature dependent and we recommend to use alpha(NiSi2) (T) = [(14.3 +/- 0.5) + (0.006 +/- 0.002) (T - 273K)] x 10(-6) K-1 whenever an accurate value of the NiSi2 thermal expansion coefficient is needed.
ISSN: 0022-3727
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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