Title: DC substrate bias effects on the physical properties of hydrogenated amorphous carbon films grown by plasma-assisted chemical vapour deposition
Authors: Buijnsters, Josephus Gerardus ×
Camero, M
Vazquez, L
Agullo-Rueda, F
Gomez-Aleixandre, C
Albella, J. M #
Issue Date: Aug-2007
Publisher: Elsevier
Series Title: Vacuum: the International Journal and Abstracting Service for Vacuum Science and Technology vol:81 issue:11-12 pages:1412-1415
Abstract: Hydrogenated amorphous carbon (a-C:H) films have been grown from argon/methane gas mixtures by electron cyclotron resonance chemical vapour deposition (ECR-CVD) on silicon substrates. The effects of the application of a DC substrate bias on the structural, morphological and mechanical properties of the films have been explored by multiple analysis techniques such as infrared and micro-Raman spectroscopy, atomic force microscopy, nanoindentation and pin-on-disk wear testing. In general, within the range of applied substrate bias (i.e. from -300 up to + 100V) we have observed a strong correlation between all measured properties of the a-C:H films and the ion energy. This work shows that the properties can differ greatly and indicates a threshold energy in the order of 90 eV. For the production of hard, low-friction coatings energies above this value are required. (C) 2007 Published by Elsevier Ltd.
ISSN: 0042-207X
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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