Title: Surface morphology stabilization by chemical sputtering in carbon nitride film growth
Authors: Buijnsters, Josephus Gerardus ×
Vazquez, L #
Issue Date: Jan-2008
Publisher: Institute of Physics and IOP Publishing
Series Title: Journal of Physics D, Applied Physics vol:41 issue:1 pages:012006-1-012006-5
Article number: DOI 10.1088/0022-3727/41/1/012006
Abstract: We have studied the influence of chemical sputtering effects on the morphology of carbon nitride films grown on silicon substrates by electron cyclotron resonance chemical vapour deposition. This study has been performed by comparing the evolution of their morphology with that of hydrogenated amorphous carbon films grown under similar conditions, where these effects are not present. When chemical sputtering effects operate we observe a film surface stabilization for length scales in the 60-750 nm range after a threshold roughness of about 3-4 nm has been developed. This stabilization is explained on the basis of the re-emission of nitrogen etching species, which is confirmed by growth experiments on microstructured substrates.
ISSN: 0022-3727
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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