Title: HfO2 atomic layer deposition using HfCl4/H2O: the first reaction cycle
Authors: Nyns, L
Delabie, Annelies
Caymax, M
Heyns, Marc
Van Elshocht, S
Vinckier, Christiaan
De Gendt, Stefan #
Issue Date: Oct-2008
Publisher: The Electrochemical Society
Host Document: ECS Transactions vol:16 issue:4 pages:257-267
Conference: ECS Meeting edition:214th location:Honolulu, HI date:12-17 October
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Molecular Design and Synthesis
Department of Materials Engineering - miscellaneous
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science