Title: Strontium niobate high-k dielectrics: Film deposition and material properties
Authors: Hardy, Adrien ×
Van Elshocht, S
Adelmann, C
Kittl, Jorge
De Gendt, Stefan
Heyns, Marc
D'Haen, J
D'Olieslaeger, A
Van Bael, M. K
Van den Rul, H
Mullens, J #
Issue Date: Jan-2010
Publisher: Pergamon-elsevier science ltd
Series Title: Acta materialia vol:58 issue:1 pages:216-225
Abstract: Strontium niobate ultrathin films were processed by water-based chemical solution deposition, an approach that offers environmental benefits. SrNb2O6 and SrNb2O7 show high-k values, which is important for applications such as alternative gate dielectrics. The study of ultrathin films (thickness <30 nm) is crucial, as this is the thickness range for the application envisaged, and as film properties depend strongly on the film thickness. SrNb2O6 had a lower crystallization temperature, less interfacial silicate, lower carbonate content, and higher roughness compared to SrNb2O7. The k values of amorphous films were limited for both compositions (k = 12-14). Crystallization and complete removal of organics or carbonates were accomplished by high-temperature annealing, but increased the roughness and leakage current. For SrNb2O7, interfacial silicates were formed as well. Intermediate calcination steps improved the surface smoothness and increased the k value of SrNb2O6 up to 30. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
ISSN: 1359-6454
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Analysis Section
Molecular Design and Synthesis
× corresponding author
# (joint) last author

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