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Title: Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition
Authors: Vitchev, Roumen ×
Malesevic, Alexander
Petrov, Roumen H
Kemps, Raymond
Mertens, Myrjam
Vanhulsel, Annick
Van Haesendonck, Christian #
Issue Date: Mar-2010
Publisher: IOP Pub.
Series Title: Nanotechnology vol:21 issue:9 pages:1-7
Article number: 095602
Abstract: A promising method for the production of few-layer graphene (FLG) is microwave plasma-enhanced chemical vapour deposition (MW PECVD). However, the growth mechanism of PECVD-synthesized FLG is not completely understood. The aim of this work was to investigate the initial stages of the growth process of FLG deposited by MW PECVD on several substrates (quartz, silicon, platinum). The deposited thin films were characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS), electron backscattered diffraction (EBSD), scanning electron microscopy (SEM) and x-ray diffraction (XRD). It was found that the initial stages of the deposition were different for the three chosen substrate materials. However, the fully grown FLG layers were similar for all substrates.
URI: 
ISSN: 0957-4484
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

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