Title: Effect of PAG distribution on ArF and EUV resist performance
Authors: Gronheid, Roel ×
Rathsack, Benjamin
Bernard, Sophie
Vaglio Pret, Alessandro
Nafus, Kathleen
Hatakeyama, Shinichi #
Issue Date: 2009
Publisher: Technical Association of Photopolymers, Japan
Series Title: Journal of Photopolymer Science and Technology vol:22 issue:1 pages:97-104
ISSN: 0914-9244
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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