Author:

Keywords:

reflection-absorption spectroscopy, ray photoelectron-spectroscopy, octadecylphosphonic acid, alkylphosphonic acid, carboxylic-acids, force microscopy, native oxides, monolayers, surfaces, xps, Science & Technology, Physical Sciences, Technology, Chemistry, Multidisciplinary, Chemistry, Physical, Materials Science, Multidisciplinary, Chemistry, Materials Science, OCTADECYLPHOSPHONIC ACID, ALKYLPHOSPHONIC ACID, CARBOXYLIC-ACIDS, NATIVE-OXIDE, SURFACE, MONOLAYERS, FILMS, XPS, CHEMISORPTION, STABILIZATION, Aluminum Oxide, Membranes, Artificial, Microscopy, Atomic Force, Organophosphonates, Particle Size, Spectrophotometry, Surface Properties, X-Rays, Chemical Physics

Abstract:

The deposition of n-octylphosphonic acid on aluminum oxide was studied. The substrate was pretreated in order to achieve a root-mean-square roughness of <1 nm, a hydroxyl fraction of 30%, and a thickness of approximately 170 nm. It was proven using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) that, rather than a monolayer, an organic multilayer was formed. The growth mechanism was identified as a Stranski-Krastanov one. It was also shown that the use of AFM, probing the surface topography, is essential for a reliable quantification and interpretation of data obtained with XPS.