Title: Study of the Self-Assembling of n-Octylphosphonic Acid Layers on Aluminum Oxide
Authors: Hauffman, Tom ×
Blajiev, Orlin
Snauwaert, Johan
Van Haesendonck, Christian
Hubin, Annick
Terryn, Herman #
Issue Date: Dec-2008
Publisher: Amer chemical soc
Series Title: Langmuir vol:24 issue:23 pages:13450-13456
Abstract: The deposition of n-octylphosphonic acid on aluminum oxide was studied. The substrate was pretreated in order to achieve a root-mean-square roughness of <1 nm, a hydroxyl fraction of 30%, and a thickness of approximately 170 nm. It was proven using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) that, rather than a monolayer, an organic multilayer was formed. The growth mechanism was identified as a Stranski-Krastanov one. It was also shown that the use of AFM, probing the surface topography, is essential for a reliable quantification and interpretation of data obtained with XPS.
ISSN: 0743-7463
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science