Title: Alternative photoresist removal process to minimize damage of low-k material induced by ash plasma
Authors: Le, Quoc Toan ×
Keldermans, Johan
Chiodarelli, Nicolo
Kesters, Els
Lux, Marcel
Claes, Martine
Vereecke, Guy #
Issue Date: Aug-2008
Publisher: Publication Board, Japanese Journal of Applied Physics
Series Title: Japanese Journal of Applied Physics 1, Regular Papers, Short Notes & Review Papers vol:47 issue:8 pages:6870-6874
ISSN: 0021-4922
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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