Title: Dynamic thermal mechanical characterization of Epoclad negative photoresist for micro mechanical structures
Authors: Wouters, Kristof ×
Puers, Robert #
Issue Date: May-2010
Publisher: North-Holland
Series Title: Microelectronic Engineering vol:87 issue:5-8 pages:1278-1280
Abstract: Dynamic thermal mechanical properties of Epoclad negative photoresist have been studied. These experiments
are part of the mechanical characterization of several photo definable polymers which can be used
as a permanent, active and, or structural layer in a MEMS. This paper reports on the visco-elastic properties
such as the loss modulus, the storage modulus and the glass transition temperature.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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