Title: Si versus Ge for future microelectronics
Authors: Claeys, Cor ×
Mitard, J
Eneman, Geert
Meuris, M
Simoen, Eddy #
Issue Date: Feb-2010
Publisher: Elsevier Sequoia
Series Title: Thin Solid Films vol:518 issue:9 pages:2301-2306
Conference: MIEL date:Juli 2009
Abstract: The quest for higher performance of scaled down technologies resulted in the use of high-mobility substrates and strain engineering approaches The development of advanced processing modules. based oil low temperature processing and deposited (MBE. ALD. epitaxially grown, etc) gate stacks, has triggered the interest of exploring Ge for sub 32 nm technology nodes A comparison between Si and Cc for future microelectronics has to take into account a variety of materials. processing and performance aspects Here special attention will be given to passivation and gate stack formation in relation to device performacne. including leakage current and reliability aspects The potential of Ge-based device Structures and the monolithic integration of Cc and III-V devices on silicon are highlighted (C) 2009 Elsevier B V All rights reserved
ISSN: 0040-6090
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science