ITEM METADATA RECORD
Title: Valence band energy in confined Si1-xGex (0.28 < x < 0.93) layers
Authors: Afanas'ev, Valeri ×
Stesmans, Andre
Souriau, L
Loo, R
Meuris, M #
Issue Date: Apr-2009
Publisher: Amer inst physics
Series Title: Applied physics letters vol:94 issue:17
Article number: 172106
Abstract: Using internal photoemission of electrons we monitored the composition dependent shift of the valence band in Si1-xGex (0.28 < x < 0.93) films confined between two layers of SiO2, as prepared by the condensation technique. As referenced to the bottom of the oxide conduction band, the increase in Ge content results in upshift in the valence band top with respect to that of pure silicon. This shift occurs nearly linearly with Ge concentration x and can be approximated as delta E-v(eV)=(0.55 +/- 0.05)x.
ISSN: 0003-6951
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Semiconductor Physics Section
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.

© Web of science