|ITEM METADATA RECORD
|Title: ||Etch rate optimization in reactive ion etching of epoxy photoresists|
|Authors: ||Driesen, Maarten|
Puers, Robert #
|Issue Date: ||Sep-2009 |
|Host Document: ||Proceedings of the Eurosensors XXIII Conference vol:1 issue:1 pages:796-799|
|Conference: ||Eurosensors edition:XXIII location:Lausanne date:6-9 september 2009|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||ESAT - MICAS, Microelectronics and Sensors|
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