Title: Development of a metrological atomic force microscope at KULeuven
Authors: Piot, Jan
Qian, Jun
Pirée, Hugo
Kotte, Gerard
Volodin, Alexander
Van Haesendonck, Chris
Reynaerts, Dominiek #
Issue Date: 2009
Host Document: Conference proceedings
Conference: Lamdamap edition:9 location:Uxbridge date:30 June - 2 July
Abstract: KULeuven is currently developing on demand of and for the national Belgian Metrology Laboratory (SMD of the Federal Public Service Economy, SMEs, Self Employed & Energy) a metrological atomic force microscope (metrological AFM) for obtaining accurate measurements at nanometre level.
The design of the metrological AFM aims at an accuracy of 1 nm over a volume of 100 um x 100 um x 100 um. The long Z-range of this metrological AFM increases the measurement volume with respect to most existing metrological AFMs, broadening its application area.
This paper gives an overview of the error sources in the system. The errors are estimated and grouped in an error budget. The estimations show that the measurement uncertainty has peak-to-peak values of 1.85 nm in the lateral directions and 1.72 nm in the vertical direction. By improving the setup, it is possible to further reduce this uncertainty.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Production Engineering, Machine Design and Automation (PMA) Section
Solid State Physics and Magnetism Section
# (joint) last author

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