Title: Oxygen chemiluminescence in He plasma as a method for plasma damage evaluation
Authors: Urbanowicz, Adam ×
Shamiryan, Denis
Baklanov, M. R
De Gendt, Stefan #
Issue Date: Oct-2008
Publisher: Elsevier
Series Title: Microelectronic Engineering vol:85 issue:10 pages:2164-2168
Conference: Materials for Advanced Microelectronics location:Dresden, Germany date:2-5 March 2008
Abstract: We propose a method for evaluating the hydrophilisation degree of low-k films upon plasma damage. The evaluation is based on optical emission spectroscopy analysis of O* emission during He plasma exposure of sample in question. The O* is presumably desorbed from damaged low-k film by vacuum-ultraviolet radiation from He plasma. The new method correlates well with other methods for plasma damage characterization such as Fourier Transform Infrared Spectroscopy and Water-Vapor Ellipsometric Porosimetry. The presented method gives a unique opportunity to assess the degree of hydrophilisation of low-k films immediately after processing. (C) 2008 Elsevier B.V. All rights reserved.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
Semiconductor Physics Section
× corresponding author
# (joint) last author

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