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Title: Electrochemical reactions at a porphyrin-copper interface
Authors: Hai, Nguyen T. M ×
Furukawa, Shuhei
Vosch, Tom
De Feyter, Steven
Broekmann, Peter
Wandelt, Klaus #
Issue Date: 2009
Publisher: Royal Society of Chemistry
Series Title: Physical Chemistry Chemical Physics vol:11 issue:26 pages:5422-5430
Abstract: The structure and reactivity of a Cu(100) single crystal electrode surface covered with free base meso-tetra (N-methyl-4-pyridinium) porphyrin (abbreviated as H2TMPyP) as a function of electrode potential have been investigated with cyclic voltammetry (CV), electrochemical scanning tunneling microscopy (ECSTM), and UV-Vis and Raman spectroscopy. The well-ordered self-assembled layer of the porphyrin is consistent with the adsorption of the reduced porphyrin species after the first two-electron reduction step. The copper dissolution reaction in the presence of the stable self-assembled porphyrin layer starts at step edges on both upper and lower terraces and coincides with the preferential oxidation of reduced porphyrin species at step sites. The dissolved copper cations are incorporated into the free base porphyrin molecules leading to the formation of CuTMPyP. As a consequence this new species accumulates in the solution with time and a copper redeposition in the cathodic potential scan is lacking.
ISSN: 1463-9076
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Imaging and Photonics
× corresponding author
# (joint) last author

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