Title: Oxidative stress and insulin resistance: The CARDIA study
Authors: Park, Kyong ×
Gross, Myron
Lee, Duk-Hee
Holvoet, Paul
Himes, John H
Shikany, James M
Jacobs, David R #
Issue Date: Jul-2009
Publisher: American Diabetes Association
Series Title: Diabetes Care vol:32 issue:7 pages:1302-1307
Abstract: Bckground: Although cumulative evidence suggests that increased oxidative stress may lead to insulin resistance in vivo or in vitro, community-based studies are scarce. Objective: This study examined the longitudinal relationships of oxidative stress biomarkers with development of insulin resistance and whether these relationships were independent of obesity in non-diabetic young adults. Research design and methods: Biomarkers of oxidative stress (F(2)-isoprostanes (F(2)Isop) and oxidized LDL (oxLDL)), insulin resistance (the homeostasis model assessment of insulin resistance (HOMA-IR), and various fatness measures (Body Mass Index (BMI), waist circumference (WC), and estimated percent fat) were obtained in a population-based observational study (Coronary Artery Risk Development in Young Adults (CARDIA)) and its ancillary study (Young Adult Longitudinal Trends in Antioxidants (YALTA)) during 2000-2006. Results: There were substantial increases in estimated mean HOMA-IR over time. OxLDL and F(2)Isop showed little association with each other. Mean evolving HOMA-IR increased with increasing levels of oxidative stress markers (P<.001 for oxLDL and p=0.06 for F(2)Isop), measured in 2000-01. After additional adjustment for adiposity, a positive association between oxLDL and HOMA-IR was strongly evident, whereas association between F(2)Isop and HOMA- Conclusion: We observed positive associations between each of two oxidative stress markers and insulin resistance. The association with oxidized LDL was independent of obesity, but that with F(2)Isop was not.
ISSN: 0149-5992
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Atherosclerosis and Metabolism (-)
× corresponding author
# (joint) last author

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