Title: Ni(Pt)Si thermal stability improvement by carbon implantation
Other Titles: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS 4: New Materials, Processes, and Equipment.
Authors: Mertens, S.
Hoffmann, T.
Vrancken, C.
Jakschik, S.
Richard, O.
Verleysen, E.
Bender, H.
Zhao, C.
Vandervorst, Wilfried
Absil, P.
Lauwers, A. #
Issue Date: 2008
Publisher: Electrochemical Society, Inc
Host Document: Electrochemical Society Transactions - ECS transactions vol:13 issue:1 pages:397-404
Conference: ECS date:2008
ISSN: 1938-5862
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Nuclear and Radiation Physics Section
# (joint) last author

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