|ITEM METADATA RECORD
|Title: ||Ni(Pt)Si thermal stability improvement by carbon implantation|
|Other Titles: ||Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-based CMOS 4: New Materials, Processes, and Equipment.|
|Authors: ||Mertens, S.|
Lauwers, A. #
|Issue Date: ||2008 |
|Publisher: ||Electrochemical Society, Inc|
|Host Document: ||Electrochemical Society Transactions - ECS transactions vol:13 issue:1 pages:397-404|
|Conference: ||ECS date:2008|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Nuclear and Radiation Physics Section|
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