Title: Characterization of post-etched photoresist and residues by various analytical techniques
Authors: Franquet, A ×
Claes, M.
Conard, T.
Kesters, E.
Vereecke, G.
Vandervorst, Wilfried #
Issue Date: Dec-2008
Publisher: New York
Series Title: Applied surface science vol:225 issue:4 pages:1408-1411
Conference: SIMS edition:XVI date:2007
ISSN: 0169-4332
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

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