Title: HfO2 as gate dielectric on Ge: interfaces and deposition techniques
Authors: Caymax, Matty *
Van Elshocht, Sven * ×
Houssa, Michel
Delabie, Annelies
Conard, Thierry
Meuris, Marc
Heyns, Marc
Dimoulas, A
Spiga, S
Fanciulli, M
Seo, Jin Won
Goncharova, L #
Issue Date: Dec-2006
Publisher: Elsevier Sequoia
Series Title: Materials Science and Engineering B, Solid-State Materials for Advanced Technology vol:135 issue:3 pages:256-260
ISSN: 0921-5107
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Semiconductor Physics Section
Physical Metallurgy and Materials Engineering Section (-)
Department of Materials Engineering - miscellaneous
* (joint) first author
× corresponding author
# (joint) last author

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