Title: Dependence of the sticking coefficient of sputtered atoms on the target-substrate distance
Authors: Mahieu, S ×
Van Aeken, K
Depla, D
Smeets, Dries
Vantomme, André #
Issue Date: Aug-2008
Publisher: Institute of Physics and IOP Publishing
Series Title: Journal of Physics D, Applied Physics vol:41 issue:15
Article number: 152005
Abstract: A Ti target was mounted on a planar magnetron and sputtered in a mixture of Ar and N-2, resulting in a flux of metallic Ti particles forming a TiN film on a substrate. The sticking coefficient of Ti was determined by comparing the Ti flux towards the substrate with the actual amount of deposited Ti particles, as determined by Rutherford backscattering spectrometry. It was observed that the sticking coefficient of Ti increases significantly with increasing target-substrate distance, but is to a lesser extent influenced by the N-2 partial pressure.
ISSN: 0022-3727
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Nuclear and Radiation Physics Section
× corresponding author
# (joint) last author

Files in This Item:
File Description Status SizeFormat
Mahieu_JPhysDApplPhys.pdfMain article Published 140KbAdobe PDFView/Open


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science