Title: Aqueous chemical solution deposition of ultrathin lanthanide oxide dielectric films
Authors: Hardy, An ×
Van Elshocht, Sven
D'Haen, Jan
Douheret, Olivier
De Gendt, Stefan
Adelmann, Christoph
Caymax, Matty
Conard, Thierry
Witters, Thomas
Bender, Hugo
Richard, Olivier
Heyns, Marc
D'Olieslaeger, Marc
Van Bael, Marlies K
Mullens, Jules #
Issue Date: Dec-2007
Publisher: Materials research soc
Series Title: Journal of materials research vol:22 issue:12 pages:3484-3493
Abstract: Ultrathin lanthanide (Nd, Pr, Eu, Sm) oxide films with functional dielectric properties down to 3.3 nm thickness were deposited by aqueous chemical solution deposition (CSD) onto hydrophilic SiO2/Si substrates. Precursor solutions were prepared from the oxides via an intermediate, solid Ln(III)citrate. A film heat treatment scheme was derived from thermogravimetric analysis of the precursor gels, showing complete decomposition by 600 degrees C. Crystalline phase formation in the films depended on the lanthanide, annealing temperature, and citric acid content in the precursor. Through variation of the precursor concentration and number of deposited layers, thickness series of uniform films were obtained down to similar to 3 nm. The film uniformity was demonstrated both by atomic force microscopy and cross-section transmission electron microscopy. The lanthanide oxide films possessed good dielectric properties. It was concluded that aqueous CSD allows deposition of uniform ultrathin films and may be useful for the evaluation of new high-k candidate materials.
ISSN: 0884-2914
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Molecular Design and Synthesis
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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