Title: Defect generation in ultrathin high permittivity gate dielectric layers
Authors: Houssa, Michel
Stesmans, André
Heyns, MM #
Issue Date: 2001
Host Document: International workshop on device technology: alternatives to SiO2 as gate dielectric for future Si-based microelectronics (Porto Alegre, Brazil, 2001)
Conference: International Workshop on Device Technology edition:1 location:Brazil date:3-5 september 2001
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Semiconductor Physics Section
# (joint) last author

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