|ITEM METADATA RECORD
|Title: ||Defects in stacks of Si with nanometre thick high-kappa dielectric layers: characterization and identification by electron spin resonance|
|Authors: ||Stesmans, Andre|
|Issue Date: ||2003 |
|Publisher: ||Institute of Physics|
|Host Document: ||High-k gate dielectrics pages:190-216|
|Description: ||Contribution to the book 'High k Gate Dielectrics'|
|Publication status: ||published|
|KU Leuven publication type: ||IHb|
|Appears in Collections:||Semiconductor Physics Section|
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