|ITEM METADATA RECORD
|Title: ||Properties of ultrathin high-kappa dielectrics on Si probed by electron spin resonance-active defects: interfaces and interlayers|
|Authors: ||Stesmans, Andre|
|Issue Date: ||2003 |
|Host Document: ||'Silicon Nitride and Silicon Dioxide Thin Insulating Films VII pages:66-78|
|Description: ||Contribution to the book 'Silicon Nitride and Silicon Dioxide Thin Insulating Films VII|
|Publication status: ||published|
|KU Leuven publication type: ||IHb|
|Appears in Collections:||Semiconductor Physics Section|
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