Title: Oxygen Chemiluminescence in a He Plasma as a Method for Plasma Damage Evaluation of Low-k Dielectrics
Authors: Urbanowicz, Adam
Baklanov, Mikhail
Shamiryan, Denis
Soberon, Felipe
Daniels, Stephen
De Gendt, Stefan #
Issue Date: Mar-2008
Conference: Workshop Materials for Advanced Metallization edition:17 location:Dresden (Germany) date:2-5 March 2008
Article number: P 8.01
Abstract: In this work we propose a new method of plasma damage evaluation based on Optical Emission Spectroscopy (OES) analysis during Helium plasma exposure of a low-k sample. We discuss the formation of oxygen radicals in the low-pressure He plasma and some practical aspects of this phenomenon.
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Molecular Design and Synthesis
# (joint) last author

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