Title: SrHfO3 as gate dielectric for future CMOS technology
Authors: Rossel, C ×
Sousa, M
Marchiori, C
Fompeyrine, J
Webb, D
Caimi, D
Mereu, B
Ispas, A
Locquet, Jean-Pierre
Siegwart, H
Germann, R
Tapponnier, A
Babich, K #
Issue Date: 2007
Series Title: Microelectronic Engineering vol:84 issue:9-10 pages:1869-1873
Conference: date:IBM Res GmbH, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland; IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
Abstract: Thin epitaxial films of the high-K perovskite SrHfO3 were grown by molecular beam epitaxy on Si(100) and investigated by ellipsometry and X-ray photoelectron spectroscopy to determine its band gap and valence band offset. Conducting AFM shows a good correlation between topography and current mapping, pointing to direct tunneling conduction. Long channels MOSFETs with low equivalent oxide thickness (EOT) were fabricated and their channel mobility measured. Mobility enhancement can be achieved by post processing annealing in various gases but at the cost of interfacial regrowth. An alternative approach is to increase mobility without changing EOT is by electrically stressing the gate dielectric at similar to 150 degrees C.
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

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