ITEM METADATA RECORD
Title: Characterization of a radio-frequency plasma source of molecular beam epitaxial growth of high-Tc superconductor films
Authors: Locquet, Jean-Pierre ×
Machler, E #
Issue Date: 1992
Publisher: AMER INST PHYSICS
Series Title: Journal of vacuum science & technology. A, An international journal devoted to vacuum, surfaces, and films vol:10 issue:5 pages:3100-3103
Abstract: The growth of superconducting oxides in vacuum conditions compatible with molecular beam epitaxy (MBE) requires a form of activated oxygen. The activated oxygen species can be either atomic oxygen (O) or ozone (O3). Here we characterize a rf plasma source by measuring the oxidation rate of a silver film on a quartz crystal deposition monitor as a function of the oxygen flow. The initial oxidation rate provides a lower limit for the actual atomic oxygen flux. If the frequency change of the quartz signal is entirely due to the oxidation of silver by atomic oxygen and we assume a detection efficiency of one, then the total cracking efficiency of the source is estimated to be around 30%. The source was used in a MBE machine to deposit thin (200 angstrom) high-T(c) films of DyBa2Co3O7 on SrTiO3 with a T(c)onset of 88K and a T(c)zero of 86 K.
ISSN: 0734-2101
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Solid State Physics and Magnetism Section
× corresponding author
# (joint) last author

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