Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine

Fritsch, E; Machler, E; Arrouy, F; Berke, H; Povey, I; Willmott, PR; Locquet, Jean-Pierre

doi:10.1116/1.580214

Schiff base precursor compounds for the chemical beam epitaxy of oxide thin films .1. Deposition of CuO on MgO[001] using copper(II) bis(benzoylacetone)-ethylendiimine

Author:

Fritsch, E

Machler, E ; Arrouy, F ; Berke, H ; Povey, I ; Willmott, PR ; Locquet, Jean-Pierre

Keywords:

GROWTH, OXYGEN, VAPOR, MOCVD, CU2O, MGO, Science & Technology, Technology, Physical Sciences, Materials Science, Coatings & Films, Physics, Applied, Materials Science, Physics, 02 Physical Sciences, 09 Engineering, Applied Physics, 40 Engineering, 51 Physical sciences

Abstract:

A new precursor compound for the deposition of copper oxide thin films under molecular beam conditio us, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial cooper oxide thin films on MgO. (C) 1996 American Vacuum Society.