Journal of vacuum science & technology. A, An international journal devoted to vacuum, surfaces, and films vol:14 issue:6 pages:3208-3213
date:IBM CORP,DIV RES,ZURICH RES LAB,CH-8803 RUSCHLIKON,SWITZERLAND; UNIV ZURICH,INST ORGAN CHEM,CH-8057 ZURICH,SWITZERLAND
A new precursor compound for the deposition of copper oxide thin films under molecular beam conditio us, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial cooper oxide thin films on MgO. (C) 1996 American Vacuum Society.