Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films .1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

Fritsch, E; Machler, E; Arrouy, F; Orama, O; Berke, H; Povey, I; Willmott, PR; Locquet, Jean-Pierre

doi:10.1021/cm9602510

Benzoylpivaloylmethanide precursors for the chemical beam epitaxy of oxide thin films .1. Synthesis, characterization, and use of yttrium benzoylpivaloylmethanide

Author:

Fritsch, E

Machler, E ; Arrouy, F ; Orama, O ; Berke, H ; Povey, I ; Willmott, PR ; Locquet, Jean-Pierre

Keywords:

VAPOR-DEPOSITION, METAL BENZOYLPIVALOYLMETHANATES, OPTICAL-PROPERTIES, GROWTH, Y2O3, SYSTEM, Science & Technology, Physical Sciences, Technology, Chemistry, Physical, Materials Science, Multidisciplinary, Chemistry, Materials Science, 03 Chemical Sciences, 09 Engineering, Materials, 34 Chemical sciences, 40 Engineering

Abstract:

The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.