5th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS 2000), Date: 2000/09/18 - 2000/09/20, Location: BELGIUM, OOSTENDE
Publication date:
2001-01-01
Volume:
76
Pages:
263 -
266
ISSN:
3-908450-57-8, 9783908450573
Publisher:
Scitec publications ltd
Ultra clean processing of silicon surfaces 2000
Author:
Vos, R
Xu, Kaidong ; Lux, M ; Fyen, Wim ; Singh, R ; Chen, Z ; Mertens, P ; Hatcher, Z ; Heyns, Marc ; Heyns, M ; Mertens, P ; Meuris, M
Keywords:
hydrophobic interactions, particle removal efficiency, surface charge, surfaces, Science & Technology, Technology, Physical Sciences, Materials Science, Multidisciplinary, Physics, Applied, Physics, Condensed Matter, Materials Science, Physics, SURFACES, 0204 Condensed Matter Physics, 0912 Materials Engineering, Applied Physics, 4016 Materials engineering
Abstract:
A basic understanding of the interactions between a particle and the wafer substrate during cleaning is presented and the usefulness of surfactants to improve the overall particle performance for dHF-cleaning mixtures is described.