Journal of Photopolymer Science and Technology

Publication date: 2011-01
Volume: 24 Pages: 233 - 238
ISSN: 0914-9244, 1349-6336
DOI: 10.2494/photopolymer.24.233
Publisher: Technical Association of Photopolymers, Japan

Author:

Winroth, Gustaf
Gronheid, Roel ; Lin, Chua ; Neishi, Katsumi ; Harukawa, Ryota ; Marcuccilli, Gino

Keywords:

Science & Technology, Physical Sciences, Polymer Science, immersion lithography, pattern collapse, defectivity, RINSE, MECHANISM, Polymers